2.3.3.3.86. NXebeam_column¶
Status:
base class (contribution), extends NXcomponent
Description:
Base class for a set of components providing a controllable electron beam. ...
Base class for a set of components providing a controllable electron beam.
The idea behind defining NXebeam_column as an own base class vs. adding these concepts in NXinstrument_em is that the electron beam generating component might be worthwhile to use in other experiments also.
Symbols:
No symbol table
- Groups cited:
NXactuator, NXaperture, NXbeam, NXcomponent, NXcorrector_cs, NXdeflector, NXfabrication, NXlens_em, NXmonochromator, NXsensor, NXsource
Structure:
operation_mode: (optional) NX_CHAR
Tech-partner, microscope-, and control-software-specific name of the ...
Tech-partner, microscope-, and control-software-specific name of the specific operation mode how the ebeam_column and its components are controlled to achieve specific illumination conditions.
In many cases the users of an instrument do not or can not be expected to know all intricate spatiotemporal dynamics of their hardware. Instead, they rely of assumptions that the instrument, its control software, and components work as expected to focus on their research questions.
For these cases, having a place for documenting the operation_mode is useful in as much as at least some constraints on how the illumination conditions were get documented.
electron_source: (optional) NXsource
A physical part of an electron or ion microscope from which ...
A physical part of an electron or ion microscope from which the particles that form the beam are emitted.
The hardware for an electron source in an electron microscope may contain several components which affect the beam path.
This concept is related to term Source of the EMglossary standard.
voltage: (optional) NX_NUMBER {units=NX_VOLTAGE}
The potential difference between anode and cathode. ...
The potential difference between anode and cathode.
This concept is related to term Acceleration Voltage of the EMglossary standard.
extraction_voltage: (optional) NX_NUMBER {units=NX_VOLTAGE}
Voltage which is used to create an electric field that draws particles from ...
Voltage which is used to create an electric field that draws particles from the source.
This concept is related to term Extraction Voltage of the EMglossary standard.
emission_current: (optional) NX_NUMBER {units=NX_CURRENT}
Electrical current which is released from the source. ...
Electrical current which is released from the source.
This concept is related to term Emission Current of the EMglossary standard.
filament_current: (optional) NX_NUMBER {units=NX_CURRENT}
Electrical current which flows through the source. ...
Electrical current which flows through the source.
This concept is related to term Filament Current of the EMglossary standard.
Type of radiation. ...
Type of radiation.
Obligatory value:
electronemitter_type: (optional) NX_CHAR
Emitter type used to create the beam. ...
Emitter type used to create the beam.
If the emitter type is other, give further details in the description field.
emitter_material: (optional) NX_CHAR
Material of which the emitter is build, e.g. the filament material.
lifetime: (optional) NX_NUMBER {units=NX_TIME}
How long has the source been in operation.
LENS_EM: (optional) NXlens_em
APERTURE: (optional) NXaperture
DEFLECTOR: (optional) NXdeflector
MONOCHROMATOR: (optional) NXmonochromator
Device to improve energy resolution or chromatic aberration. ...
Device to improve energy resolution or chromatic aberration.
Examples are Wien, $textalpha$-, or $Omega$- energy filter or cc corrector like
type: (optional) NX_CHAR
Qualitative type of the component. ...
Qualitative type of the component.
Any of these values:
wien
alfa
omega
castaing_henry
gatan_imaging
sector_analyzerapplied: (optional) NX_BOOLEAN ⤆
Was the corrector used?
dispersion: (optional) NX_NUMBER {units=NX_ANY}
Energy dispersion in e.g. µm/eV.
voltage: (optional) NX_NUMBER {units=NX_VOLTAGE}
Corresponding voltage for that energy dispersion.
FABRICATION: (optional) NXfabrication ⤆
corrector_cs: (optional) NXcorrector_cs
corrector_ax: (optional) NXcomponent
Component that reshapes an ellipse-shaped electron beam into a circular one. ...
Component that reshapes an ellipse-shaped electron beam into a circular one.
Stigmator is an exact synonym.
value_x: (optional) NX_NUMBER {units=NX_ANY}
Descriptor for the correction strength along the first direction when exact ...
Descriptor for the correction strength along the first direction when exact technical details are unknown or not directly controllable as the control software of the microscope does not enable or was not configured to display these values for users.
value_y: (optional) NX_NUMBER {units=NX_ANY}
Descriptor for the correction strength along the second direction when exact ...
Descriptor for the correction strength along the second direction when exact technical details are unknown or not directly controllable as the control software of the microscope does not enable or was not configured to display these values for users.
BIPRISM: (optional) NXcomponent
Electron biprism as it is used e.g. for electron holography.
FABRICATION: (optional) NXfabrication ⤆
PHASEPLATE: (optional) NXcomponent
Device that causes a change in the phase of an electron wave. ...
Device that causes a change in the phase of an electron wave.
type: (optional) NX_CHAR
Qualitative type ...
Qualitative type
Any of these values or a custom value (if you use a custom value, also set @custom=True):
thin_film|electrostaticFABRICATION: (optional) NXfabrication ⤆
COMPONENT: (optional) NXcomponent
SENSOR: (optional) NXsensor
ACTUATOR: (optional) NXactuator
BEAM: (optional) NXbeam
Individual characterization results for the position, shape, ...
Individual characterization results for the position, shape, and characteristics of the electron beam at a given location.
NXtransformations should be used to specify the location or the position at which details about the beam were probed.
This concept is related to term Electron Beam of the EMglossary standard.
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