General
InsertReduction¶
description: The reduction that sometimes is used to lodge the substrate in the substrate holder position.
inherits from: nomad.datamodel.metainfo.basesections.v1.Entity
properties:
| name | type | |
|---|---|---|
| name | str |
A short and descriptive name for this insert reduction. |
| lab_id | str |
An ID string for the insert to be put in the substrate holder. It is unique at least for the lab that produced this data. |
| image | str |
A photograph or image of the insert to be lodged in the substrate holder. |
| material | nomad.datamodel.metainfo.basesections.v1.PubChemPureSubstanceSection |
sub-section, repeats |
| inner_geometry | nomad_material_processing.general.Geometry |
sub-section |
| outer_geometry | nomad_material_processing.general.Geometry |
sub-section |
normalization:
- If the instance is of type
EntryData, it sets the archive's entry name based on the instance's name. - Sets the
datetimefield to the current time if it is not already set. - Manages the
lab_idfield and updates the archive'sresults.eln.lab_idslist. - Adds the instance's
nameanddescriptionto the archive'sresults.eln.namesandresults.eln.descriptionslists, respectively. - Handles the
tagsattribute, if present, and updates the archive'sresults.eln.tagslist. - Appends the section's name to the archive's
results.eln.sectionslist.
InsertReductionReference¶
description: A section used for referencing a FilledSubstrateHolderPDI.
inherits from: nomad.datamodel.metainfo.basesections.v1.EntityReference
properties:
| name | type | |
|---|---|---|
| reference | InsertReduction |
Optional description of insert if used. |
normalization:
Will attempt to fill the reference from the lab_id or vice versa.
SubstrateHolderPosition¶
description: One casing position of the substrate holder.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| name | str |
A short name for this position. This name is used as label of the position. |
| x_position | float |
The x coordinate of the substrate holder position relative to the center of the holder.unit=meter |
| y_position | float |
The y coordinate of the substrate holder position relative to the center of the holder.unit=meter |
| slot_geometry | nomad_material_processing.general.Geometry |
sub-section |
SubstrateHolder¶
description: The holder for the substrate.
inherits from: nomad.datamodel.metainfo.basesections.v1.Entity
properties:
| name | type | |
|---|---|---|
| name | str |
A short and descriptive name for this position. |
| lab_id | str |
The lab ID of the substrate holder. |
| thickness | float |
The thickness of the holder to the back of the substrate.unit=meter |
| outer_diameter | float |
The outer diameter of the substrate holder.unit=meter |
| number_of_positions | int |
The number of positions on the holder. |
| image | str |
An image of the substrate holder. |
| holder_material | nomad.datamodel.metainfo.basesections.v1.PubChemPureSubstanceSection |
sub-section, repeats |
| positions | SubstrateHolderPosition |
sub-section, repeats |
normalization:
- If the instance is of type
EntryData, it sets the archive's entry name based on the instance's name. - Sets the
datetimefield to the current time if it is not already set. - Manages the
lab_idfield and updates the archive'sresults.eln.lab_idslist. - Adds the instance's
nameanddescriptionto the archive'sresults.eln.namesandresults.eln.descriptionslists, respectively. - Handles the
tagsattribute, if present, and updates the archive'sresults.eln.tagslist. - Appends the section's name to the archive's
results.eln.sectionslist.
FilledSubstrateHolderPosition¶
description: One casing position of the filled substrate holder.
inherits from: SubstrateHolderPosition
properties:
| name | type | |
|---|---|---|
| insert_reduction | InsertReductionReference |
The Insert reduction placed in this position.sub-section |
| substrate | nomad.datamodel.metainfo.basesections.v1.CompositeSystemReference |
The substrate that is placed in this position.sub-section |
FilledSubstrateHolder¶
description: A substrate holder that is filled with substrate(s).
inherits from: SubstrateHolder
properties:
| name | type | |
|---|---|---|
| substrate_holder | SubstrateHolder |
A reference to an empty substrate holder. |
| positions | FilledSubstrateHolderPosition |
sub-section, repeats |
normalization:
- If the instance is of type
EntryData, it sets the archive's entry name based on the instance's name. - Sets the
datetimefield to the current time if it is not already set. - Manages the
lab_idfield and updates the archive'sresults.eln.lab_idslist. - Adds the instance's
nameanddescriptionto the archive'sresults.eln.namesandresults.eln.descriptionslists, respectively. - Handles the
tagsattribute, if present, and updates the archive'sresults.eln.tagslist. - Appends the section's name to the archive's
results.eln.sectionslist.
MolarFlowRate¶
description: Molar flow rate is the amount of a substance which passes per unit of time.
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| measurement_type | ['Assumed', 'Mass Flow Controller'] |
|
| value | float |
The observed value as a function of time.shape=['*'], unit=mole / second |
| set_value | float |
The set value(s) (i.e. the intended values) set.shape=['*'], unit=mole / second |
EvaporationSource¶
inherits from: nomad.datamodel.data.ArchiveSection
VaporDepositionSource¶
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| name | str |
A short and descriptive name for this source. |
| material | nomad.datamodel.metainfo.basesections.v1.Component |
The source of the material that is being evaporated. Example: A sputtering target, a powder in a crucible, etc.sub-section, repeats |
| vapor_source | EvaporationSource |
Example: A heater, a filament, a laser, a bubbler, etc.sub-section |
| vapor_molar_flow_rate | MolarFlowRate |
The rate of the material being evaporated (mol/time).sub-section |
GrowthRate¶
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| measurement_type | ['Assumed', 'RHEED', 'Reflectance'] |
|
| value | float |
The observed value as a function of time.shape=['*'], unit=meter / second |
| set_value | float |
The set value(s) (i.e. the intended values) set.shape=['*'], unit=meter / second |
Temperature¶
description: Generic Temperature monitoring
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| measurement_type | ['Assumed', 'Heater thermocouple', 'Pyrometer', 'Thermocouple'] |
|
| value | float |
The observed value as a function of time.shape=['*'], unit=kelvin |
| set_value | float |
The set value(s) (i.e. the intended values) set.shape=['*'], unit=kelvin |
SampleParameters¶
inherits from: nomad.datamodel.metainfo.plot.PlotSection, nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| growth_rate | GrowthRate |
The growth rate of the thin film (length/time). Measured by in-situ RHEED or Reflection or assumed.sub-section |
| substrate_temperature | Temperature |
sub-section |
| layer | nomad_material_processing.general.ThinFilmReference |
The thin film that is being created during this step.sub-section |
| substrate | nomad_material_processing.general.ThinFilmStackReference |
The thin film stack that is being evaporated on.sub-section |
normalization without further documentation
Pressure¶
description: The pressure during the deposition process.
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float |
The observed value as a function of time.shape=['*'], unit=pascal |
| time | float |
The process time when each of the values were recorded.shape=['*'], unit=second |
| set_value | float |
The set value(s) (i.e. the intended values) set.shape=['*'], unit=pascal |
| set_time | float |
The process time when each of the set values were set. If this is empty and only one set value is present, it is assumed that the value was set at the start of the process step. If two set values are present, it is assumed that a linear ramp between the two values was set.shape=['*'], unit=second |
VolumetricFlowRate¶
description: The volumetric flow rate of a gas at standard conditions, i.e. the equivalent rate at a temperature of 0 °C (273.15 K) and a pressure of 1 atm (101325 Pa).
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| measurement_type | ['Flow Meter', 'Mass Flow Controller', 'Other'] |
|
| value | float |
The observed value as a function of time.shape=['*'], unit=meter ** 3 / second |
| set_value | float |
The set value(s) (i.e. the intended values) set.shape=['*'], unit=meter ** 3 / second |
GasFlow¶
description: Section describing the flow of a gas.
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| gas | nomad.datamodel.metainfo.basesections.v1.PureSubstanceSection |
sub-section |
| flow_rate | VolumetricFlowRate |
sub-section |
SubstrateHeater¶
inherits from: nomad.datamodel.data.ArchiveSection
ChamberEnvironment¶
inherits from: nomad.datamodel.data.ArchiveSection
properties:
| name | type | |
|---|---|---|
| gas_flow | GasFlow |
sub-section, repeats |
| pressure | Pressure |
sub-section |
| heater | SubstrateHeater |
sub-section |
VaporDepositionStep¶
description: A step of any vapor deposition process.
inherits from: nomad.datamodel.metainfo.basesections.v1.ActivityStep
properties:
| name | type | |
|---|---|---|
| creates_new_thin_film | bool |
Whether or not this step creates a new thin film.default=False |
| duration | float |
unit=second |
| sources | VaporDepositionSource |
sub-section, repeats |
| sample_parameters | SampleParameters |
sub-section, repeats |
| environment | ChamberEnvironment |
sub-section |
normalization:
The normalizer for the VaporDepositionStep class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
VaporDeposition¶
description: VaporDeposition is a general class that encompasses both Physical Vapor Deposition (PVD) and Chemical Vapor Deposition (CVD). It involves the deposition of material from a vapor phase to a solid thin film or coating onto a substrate. - material sources: Both PVD and CVD involve a source material that is transformed into a vapor phase. In PVD, the source material is physically evaporated or sputtered from a solid target. In CVD, gaseous precursors undergo chemical reactions to produce a solid material on the substrate. - substrate: The substrate is the material onto which the thin film is deposited. - environment: The process typically takes place in a controlled environment. The deposition is usually affected by the pressure in the chamber. For some processes additional background gasses are also added.
inherits from: nomad_material_processing.general.SampleDeposition
links: http://purl.obolibrary.org/obo/CHMO_0001314, http://purl.obolibrary.org/obo/CHMO_0001356
properties:
| name | type | |
|---|---|---|
| steps | VaporDepositionStep |
The steps of the deposition process.sub-section, repeats |
normalization:
The normalizer for the VaporDeposition class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.