Sputtering
SputterDeposition¶
description: A synthesis technique where a solid target is bombarded with electrons or energetic ions (e.g. Ar+) causing atoms to be ejected ('sputtering'). The ejected atoms then deposit, as a thin-film, on a substrate. [database_cross_reference: https://orcid.org/0000-0002-0640-0422]
Synonyms: - sputtering - sputter coating
inherits from: nomad_material_processing.vapor_deposition.pvd.general.PhysicalVaporDeposition
links: http://purl.obolibrary.org/obo/CHMO_0001364
properties:
| name | type | |
|---|---|---|
| method | str |
A short consistent handle for the applied method.default=Sputter Deposition |
normalization:
The normalizer for the SputterDeposition class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.