General
SourcePower¶
description: The power supplied to the source (watt).
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| value | float |
The observed value as a function of time.shape=['*'], unit=watt |
| set_value | float |
The set value(s) (i.e. the intended values) set.shape=['*'], unit=watt |
PVDEvaporationSource¶
inherits from: nomad_material_processing.vapor_deposition.general.EvaporationSource
properties:
| name | type | |
|---|---|---|
| power | SourcePower |
sub-section |
ImpingingFlux¶
description: The impinging flux of the material onto the substrate (mol/area/time).
inherits from: nomad_material_processing.general.TimeSeries
properties:
| name | type | |
|---|---|---|
| measurement_type | ['Assumed', 'Quartz Crystal Microbalance'] |
|
| value | float |
The observed value as a function of time.shape=['*'], unit=mole / meter ** 2 / second |
| set_value | float |
The set value(s) (i.e. the intended values) set.shape=['*'], unit=mole / meter ** 2 / second |
PVDSource¶
inherits from: nomad_material_processing.vapor_deposition.general.VaporDepositionSource
properties:
| name | type | |
|---|---|---|
| vapor_source | PVDEvaporationSource |
Example: A heater, a filament, a laser, etc.sub-section |
| impinging_flux | ImpingingFlux |
The deposition rate of the material onto the substrate (mol/area/time).sub-section, repeats |
PVDSampleParameters¶
inherits from: nomad_material_processing.vapor_deposition.general.SampleParameters
properties:
| name | type | |
|---|---|---|
| heater | ['CO2 laser', 'Filament', 'Halogen lamp', 'No heating', 'Resistive element'] |
What is the substrate heated by. |
| distance_to_source | float |
The distance between the substrate and all the sources. In the case of multiple sources, the distances are listed in the same order as the sources are listed in the parent VaporDepositionStep section.shape=['*'], unit=meter |
normalization without further documentation
PVDStep¶
description: A step of any physical vapor deposition process.
inherits from: nomad_material_processing.vapor_deposition.general.VaporDepositionStep
properties:
| name | type | |
|---|---|---|
| sources | PVDSource |
sub-section, repeats |
| sample_parameters | PVDSampleParameters |
sub-section, repeats |
normalization:
The normalizer for the PVDStep class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.
PhysicalVaporDeposition¶
description: A synthesis technique where vaporized molecules or atoms condense on a surface, forming a thin layer. The process is purely physical; no chemical reaction occurs at the surface. [database_cross_reference: https://orcid.org/0000-0002-0640-0422]
Synonyms: - PVD - physical vapor deposition
inherits from: nomad_material_processing.vapor_deposition.general.VaporDeposition
links: http://purl.obolibrary.org/obo/CHMO_0001356
properties:
| name | type | |
|---|---|---|
| steps | PVDStep |
The steps of the deposition process.sub-section, repeats |
normalization:
The normalizer for the PhysicalVaporDeposition class.
Args: archive (EntryArchive): The archive containing the section that is being normalized. logger (BoundLogger): A structlog logger.